VSim 专业电磁粒子仿真软件


-- 放电等离子体与材料处理应用

    VSim可以用于材料表面处理工艺中等离子体放电设备,如介质阻挡放电,磁控溅射等的机理分析、设备设计和参数优化等等。也可以用于类似的离子源设备仿真和设计。


1. 介质阻挡放电模拟

    VSim可以对介质阻挡放电(DBD)过程进行模拟。


1.1 大气压介质阻挡放电发生器模拟

    利用VSim的粒子雪崩控制和电荷追踪能力,可以跟踪小尺寸大气压介质阻挡放电的全过程。
    应用论文参见:"Particle-in-Cell modeling of the pulsed DBD plasma actuator", 40th Fluid Dynamics Conference and Exhibit 28 June - 1 July 2010, Chicago, Illinois。


1.2 介质阻挡放电的医学应用仿真


2. 磁控溅射模拟

    利用VSim的等离子体和溅射模块,可以研究磁控溅射过程中的等离子体和粒子分布。

"VSim was an essential tool for us in our modeling of magnetron sputtering," said Geejo Lee, manager of Process CI Team, LG Display Co., LTD. "Thanks to the vast array of capabilities available through VSim including both physics and its parallel computation, we were able to accurately predict the erosion profiles from our current designs and VSim continues to allow us to optimize our designs for the future. The support staff at Tech-X was also extremely helpful during the initial set-up and modeling process."


3. 空心阴极电子发射模拟 (Nuclear Instruments and Methods in Physics Research B 261 (2007) 204–208)

    VSim可以模拟小尺寸空心阴极的放电过程。

 

 

1.VSim软件简介
2.激光等离子体作用
3.微波源与微波器件研究
4.高电压放电与脉冲功率设备
5.加速器应用
7.航天与空间等离子体研究
8.复杂介质中的电磁波
9.雷达与天线设计
10.多物理场仿真